Dwivedi, Neeraj and Kumar, Sushil and -, Ishpal and Dayal, Saurabh and -, Govind and Rauthan, C. M. S. and Panwar, O. S. (2010) Studies of nanostructured copper/hydrogenated amorphous carbon multilayer films. Journal of Alloys and Compounds, 509 (4). 1285 -1293. ISSN 0925-8388

PDF - Published Version Restricted to Registered users only Download (957Kb) | Request a copy

Abstract

Nanostructured copper/hydrogenated amorphous carbon (a-C:H) multilayer grown in a low base vacuum (1 × 10−3 Torr) system combining plasma-enhanced chemical vapor deposition and sputtering techniques. These nanostructured multilayer were found to exhibit improved electrical, optical, surface and structural properties, compared to that of monolayer a-C:H films. The residual stresses of such multilayer structure were found well below 1 GPa. Scanning electron microscopy and atomic force microscopy results revealed a nanostructured surface morphology and low surface roughnesses values. X-ray photoelectron spectroscopy, secondary ion mass spectroscopy and energy dispersive X-ray analysis confirmed a very small amount of copper in these films. These structures exhibited very high optical transparency in the near infrared region (∼90%) and the optical band gap varied from 1.35 to 1.7 eV. It was noticed that the temperature dependent conductivity improved due to the presence of both copper and the nano-structured morphology.

Item Type:	Article
Additional Information:	Copyright for this article belongs to M/s Elsevier B.V.
Uncontrolled Keywords:	Multilayer; Low vacuum; Nanostructure
Subjects:	Chemistry Chemistry > Physical Chemistry Materials Science Metallurgy & Metallurgical Engineering
Divisions:	UNSPECIFIED
Depositing User:	Mr. Abhishek Yadav
Date Deposited:	26 Oct 2012 08:17
Last Modified:	26 Oct 2012 08:17
URI:	http://npl.csircentral.net/id/eprint/760

Actions (login required)

View Item