Pavunny, S. P. and Misra, P. and Thomas, R. and Kumar, A. and Schubert, J. and Scott, J. F. and Katiyar, R. S. (2013) Advanced high-k gate dielectric amorphous LaGdO3 gated metal-oxide-semiconductor devices with sub-nanometer equivalent oxide thickness. Applied Physics Letters, 102 (192904). ISSN 0003-6951

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Abstract

Careful selection of pulsed laser deposition conditions was executed to achieve sub-nanometer EOT (equivalent oxide thickness) in amorphous LaGdO3 based high-k/metal gate stacks. The lowest EOTs attained were similar to 5.4 angstrom and 8.4 angstrom with and without quantum mechanical correction, respectively. The electrical measurements yielded a high permittivity of 20.5 +/- 2.4, a thin bottom interfacial layer of thickness 4.5 +/- 1 angstrom, and interface (cm(-2) eV(-1)) and fixed (cm(-2)) charge densities of similar to 10(12). Analysis of temperature dependent leakage currents revealed that gate injection current was dominated by Schottky emission below 1.2 MV/cm and quantum mechanical tunneling above this field. The physical origin of substrate injection was found to be a combination of Schottky emission and trap assisted tunneling

Item Type:	Article
Additional Information:	Copyright for this article belongs to M/s AIP Publishing.
Subjects:	Applied Physics/Condensed Matter
Divisions:	UNSPECIFIED
Depositing User:	Users 27 not found.
Date Deposited:	28 May 2020 10:55
Last Modified:	28 May 2020 10:55
URI:	http://npl.csircentral.net/id/eprint/2978

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