Bhattacharyya, R. and Mukherjee, C. and Kumar, Sushil and Dixit, P. N. (2015) Cold Plasma Processing for some Novel Material Development. In: INTERNATIONAL CONFERENCE ON EMERGING INTERFACES OF PLASMA SCIENCE AND TECHNOLOGY (EIPT-2015), MAR 09-10, 2015, Ujjain, INDIA.
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Abstract
Versatility of cold plasma processing has made its deployment in numerous fields possible and is now seen as a vehicle for creation of wealth. In this paper we show how it has been successfully used in high rate deposition of device quality amorphous Hydrogenated Silicon thin films, stress relived Diamond Like Carbon (DLC) films, as also in growingGem quality diamondfilms
| Item Type: | Conference or Workshop Item (Paper) |
|---|---|
| Subjects: | Applied Physics/Condensed Matter Physics > Physics of Fluids and Plasmas |
| Divisions: | UNSPECIFIED |
| Depositing User: | Dr. Rajpal Walke |
| Date Deposited: | 20 Sep 2016 06:54 |
| Last Modified: | 20 Sep 2016 06:54 |
| URI: | http://npl.csircentral.net/id/eprint/1737 |
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