Bhattacharyya, R. and Mukherjee, C. and Kumar, Sushil and Dixit, P. N. (2015) Cold Plasma Processing for some Novel Material Development. In: INTERNATIONAL CONFERENCE ON EMERGING INTERFACES OF PLASMA SCIENCE AND TECHNOLOGY (EIPT-2015), MAR 09-10, 2015, Ujjain, INDIA.

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Versatility of cold plasma processing has made its deployment in numerous fields possible and is now seen as a vehicle for creation of wealth. In this paper we show how it has been successfully used in high rate deposition of device quality amorphous Hydrogenated Silicon thin films, stress relived Diamond Like Carbon (DLC) films, as also in growingGem quality diamondfilms

Item Type: Conference or Workshop Item (Paper)
Subjects: Applied Physics/Condensed Matter
Physics > Physics of Fluids and Plasmas
Depositing User: Dr. Rajpal Walke
Date Deposited: 20 Sep 2016 06:54
Last Modified: 20 Sep 2016 06:54

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