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Number of items: 2.

Article

-, Vandana and Batra, Neha and Gope, Jhuma and Singh, Rajbir and Panigrahi, Jagannath and Tyagi, Sanjay and Pathi, P. and Srivastava, S. K. and Rauthan, C. M. S. and Singh, P. K. (2014) Effect of low thermal budget annealing on surface passivation of silicon by ALD based aluminum oxide films. Physical Chemistry Chemical Physics, 16 (39). 21804-21811 . ISSN 1463-9076

Conference or Workshop Item

-, Vandana and Batra, Neha and Gope, Jhuma and Rauthan, CMS and Sharma, Mukul and Srivastava, Ritu and Srivastava, S. K. and Pathi, P. and Singh, P. K. (2014) Silicon Surface Passivation by Al2O3 film using Atomic Layer Deposition. In: 17th International Workshop on the Physics of Semiconductor Devices (IWPSD) , DEC 10-14, 2013, Noida, INDIA .

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