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Gope, Jhuma and Kumar, Sushil and Sudhakar, S. and Lodhi, Kalpana and Rauthan, C. M. S. and Srivastava, P. C. (2013) Influence of argon dilution on the growth of amorphous to ultra nanocrystalline silicon films using VHF PECVD process. Journal of Alloys and Compounds, 577. pp. 710-716. ISSN 0925-8388