Panwar, O. S. and Khan, Mohd. Alim and Kumar, Mahesh and Shivaprasad , S. M. and Satyanarayana, B. S. and Dixit, P. N. and Bhattacharyya, R. and Khan, M. Y. (2008) Effect of high substrate bias and hydrogen and nitrogen incorporation on filtered cathodic vacuum arc deposited tetrahedral amorphous carbon films. Thin Solid Films, 516 (8). pp. 2331-2340. ISSN 0040-6090

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Abstract

The application of a sufficiently high negative substrate bias, during the growth of tetrahedral amorphous carbon (ta-C), is usually associated with low sp3 bonding configuration and stressed films. However, in an effort to understand and utilize the higher pseudo thermo dynamical conditions during the film growth, at high negative substrate bias (− 300 V), reported here is a study on ta-C films grown under different hydrogen and nitrogen concentration. As grown ta-C films were studied under different negative substrate bias conditions. The variation of the sp3 content and sp3/sp2 ratio in the ta-C films exhibits a trend similar to those reported in literature, with a subtle variation in this report being the substrate bias voltage, which was observed to be around − 200 V, for obtaining the highest sp3 (80%) bonding and sp3/sp2 (3.95) ratio. The hydrogen and nitrogen incorporated ta-C films studied, at a bias of − 300 V, show an increase in sp3 (87–91%) bonding and sp3/sp2 (7–10) ratio in the range of studies reported. The inference is drawn on the basis of the set of data obtained from measurements carried out using X-ray photoelectron spectroscopy, X-ray induced Auger electron spectroscopy and Raman spectroscopy of as grown and hydrogen and nitrogen incorporated ta-C films deposited using an S bend filtered cathodic vacuum arc system. The study indicates the possibility of further tailoring ta-C film properties and also extending capabilities of the cathodic arc system for developing carbon based films for electronics and tribological applications.

Item Type:	Article
Additional Information:	Copyright for this article belongs to M/s Elsevier B.V.
Uncontrolled Keywords:	X-ray photoelectron spectroscopy (XPS); X-ray induced Auger electron spectroscopy (XAES); Raman spectroscopy; ta-C; ta-C:H; ta-C:N films; Filtered cathodic vacuum arc (FCVA) process; High substrate bias
Subjects:	Materials Science Physics
Divisions:	UNSPECIFIED
Depositing User:	Ms Neetu Chandra
Date Deposited:	06 Jan 2014 09:55
Last Modified:	06 Jan 2014 09:55
URI:	http://npl.csircentral.net/id/eprint/992

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