Panwar, O. S. and Khan, M. A. and Kumar, Satyendra and Basu, A. and Mehta , B. R. and Kumar, Sushil and -, Ishpal (2010) Effect of high substrate bias and hydrogen and nitrogen incorporation on spectroscopic ellipsometric and atomic force microscopic studies of tetrahedral amorphous carbon films. Surface & Coatings Technology, 205 (7). pp. 2126-2133. ISSN 0257-8972

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Abstract

The influence of substrate bias and hydrogen/nitrogen incorporation on the optical properties [studied by spectroscopic ellipsometry (SE)] and surface morphology [studied by atomic force microscopy] of tetrahedral amorphous carbon (ta-C) films, deposited by S bend filtered cathodic vacuum arc (FCVA) process, is reported. SE spectra of the imaginary part of the dielectric constant are used to estimate carbon bonding ratios. In ta-C films, optical constants increase with substrate bias and hydrogen/nitrogen incorporation. The optical band gap (Eg) and sp3 content increase up to −200 V substrate bias and then decrease. Eg increases with hydrogen incorporation but is unchanged by nitrogen incorporation.

Item Type:	Article
Additional Information:	Copyright for this article belongs to M/s. Elsevier B.V.
Uncontrolled Keywords:	SE; ta-C; ta-C:H; ta-C:N; Substrate bias; Carbon bonding
Subjects:	Materials Science Physics
Divisions:	UNSPECIFIED
Depositing User:	Ms Neetu Chandra
Date Deposited:	04 Apr 2012 11:25
Last Modified:	04 Apr 2012 11:25
URI:	http://npl.csircentral.net/id/eprint/98

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