Kumar, Praveen and Kumar, Mahesh and -, Govind and Mehta , B. R. and Shivaprasad , S. M. (2009) XPS investigation of ion beam induced conversion of GaAs(0 0 1) surface into GaN overlayer. Applied Surface Science, 256 (2). pp. 517-520. ISSN 0169-4332

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For the advance of GaN based optoelectronic devices, one of the major barriers has been the high defect density in GaN thin films, due to lattice parameter and thermal expansion incompatibility with conventional substrates. Of late, efforts are focused in fine tuning epitaxial growth and in search for a low temperature method of forming low defect GaN with zincblende structure, by a method compatible to the molecular beam epitaxy process. In principle, to grow zincblende GaN the substrate should have four-fold symmetry and thus zincblende GaN has been prepared on several substrates including Si, 3C–SiC, GaP, MgO, and on GaAs(0 0 1). The iso-structure and a common shared element make the epitaxial growth of GaN on GaAs(0 0 1) feasible and useful. In this study ion-induced conversion of GaAs(0 0 1) surface into GaN at room temperature is optimized. At the outset a Ga-rich surface is formed by Ar+ ion bombardment. Nitrogen ion bombardment of the Ga-rich GaAs surface is performed by using 2–4 keV energy and fluence ranging from 3 × 1013 ions/cm2 to 1 × 1018 ions/cm2. Formation of surface GaN is manifested as chemical shift. In situ core level and true secondary electron emission spectra by X-ray photoelectron spectroscopy are monitored to observe the chemical and electronic property changes. Using XPS line shape analysis by deconvolution into chemical state, we report that 3 keV N2+ ions and 7.2 × 1017 ions/cm2 are the optimal energy and fluence, respectively, for the nitridation of GaAs(0 0 1) surface at room temperature. The measurement of electron emission of the interface shows the dependence of work function to the chemical composition of the interface. Depth profile study by using Ar+ ion sputtering, shows that a stoichiometric GaN of 1 nm thickness forms on the surface. This, room temperature and molecular beam epitaxy compatible, method of forming GaN temperature can serve as an excellent template for growing low defect GaN epitaxial overlayers.

Item Type: Article
Additional Information: Copyright for this article belongs to M/s Elsevier B.V.
Uncontrolled Keywords: GaAs; GaN; XPS
Subjects: Chemistry
Materials Science
Depositing User: Ms Neetu Chandra
Date Deposited: 31 Oct 2012 09:36
Last Modified: 31 Oct 2012 09:36
URI: http://npl.csircentral.net/id/eprint/785

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