Kuyyalil, Jithesh and -, Govind and Kumar, Mahesh and S. M. , Shivaprasad (2010) Clustering and layering of In adatoms on low and high index silicon surfaces: A comparative study. Surface Science, 604 (21-22). pp. 1972-1977. ISSN 0039-6028

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Using the morphological differences of low and high index surfaces as templates for metal growth, several low dimensional overlayer structures with novel structural and electronic properties can be formed. We present here a first report on submonolayer adsorption and residual thermal desorption studies of In adatoms on reconstructed high index Si (5 5 12)−2 × 1 surface and compare it with the observations on planar Si (111)−7 × 7 surface. The study is done by using in-situ Ultra High Vacuum surface sensitive probes like Auger Electron Spectroscopy (AES) and Low Energy Electron Diffraction (LEED). These conventional wide area techniques provide an understanding of atomistic issues involved in the evolution of the interface. We have observed an anomalous growth mode during adsorption at room temperature (RT) above 2ML, which includes adatom layering and clustering on Si (111) surface. This is also manifested during the desorption experiments on both surfaces, and the subtle differences on the two surfaces are discussed. The observation of LEED pattern during the adsorption process shows formation of different superstructural phases on Si (111)−7 × 7 surface. On Si (5 5 12) 2 × 1 surface we observe the sequential 2× (225), 2× (337) and 2× (113) facet formation during adsorption/desorption, which include quasi 1D-nanowire/chain structures. A combination of lattice strain effects, presence of step-edge barrier and quantum size effects are employed to speculate the differences in adsorption and desorption.

Item Type: Article
Subjects: Chemistry
Depositing User: Ms Neetu Chandra
Date Deposited: 27 Feb 2012 10:46
Last Modified: 26 Mar 2012 07:18
URI: http://npl.csircentral.net/id/eprint/43

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