-, Ishpal and Panwar, O. S. and Kumar, Mahesh and Kumar, Sushil (2010) X-ray photoelectron spectroscopic study of nitrogen incorporated amorphous carbon films embedded with nanoparticles. Applied Surface Science, 256 (24). pp. 7371-7376. ISSN 0169-4332

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The effect of substrate bias on X-ray photoelectron spectroscopy (XPS) study of nitrogen incorporated amorphous carbon (a-C:N) films embedded with nanoparticles deposited by filtered cathodic jet carbon arc technique is discussed. High resolution transmission electron microscope exhibited initially the amorphous structure but on closer examination the film was constituted of amorphous phase with the nanoparticle embedded in the amorphous matrix. X-ray diffraction study reveals dominantly an amorphous nature of the film. A straight forward method of deconvolution of XPS spectra has been used to evaluate the sp3 and sp2 contents present in these a-C:N films. The carbon (C 1s) peaks have been deconvoluted into four different peaks and nitrogen (N 1s) peaks have been deconvoluted into three different peaks which attribute to different bonding state between C, N and O. The full width at half maxima (FWHM) of C 1s peak, sp3 content and sp3/sp2 ratio of a-C:N films increase up to −150 V substrate bias and beyond −150 V substrate bias these parameters are found to decrease. Thus, the parameters evaluated are found to be dependent on the substrate bias which peaks at −150 V substrate bias.

Item Type: Article
Additional Information: Copyright for this article belongs to M/s Elsevier B.V.
Uncontrolled Keywords: XPS; Filtered cathodic jet carbon arc; Nanoparticle; a-C:N; Substrate bias
Subjects: Chemistry
Materials Science
Depositing User: Ms Neetu Chandra
Date Deposited: 08 Aug 2012 11:24
Last Modified: 08 Aug 2012 11:24
URI: http://npl.csircentral.net/id/eprint/393

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