Dwivedi, Neeraj and Kumar, Sushil and Malik, Hitendra K. and Sreekumar, C. and Dayal, Saurabh and Rauthan, C. M. S. and Panwar, O. S. (2012) Investigation of properties of Cu containing DLC films produced by PECVD process. Journal of Physics and Chemistry of Solids, 73 (2). pp. 308-316. ISSN 0022-3697

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Copper containing diamond like carbon (Cu-DLC) thin films were deposited on various substrates at a base pressure of 1 x 10(-3) Torr using a hybrid system involving DC-sputtering and radio frequency-plasma enhanced chemical vapor deposition (RF-PECVD) techniques. The compressive residual stresses of these films were found to be considerably lower, varying between 0.7 and 0.94 GPa and Cu incorporation in these films improve their conductivity significantly. Their structural properties were studied by Raman spectroscopy, atomic force microscopy, scanning electron microscopy, x-ray photoelectron spectroscopy and X-ray diffraction techniques that clearly revealed the presence of Cu in the DLC structure. Raman analysis yields that Cu incorporation in DLC enhances the graphite-like sp(2) bonding. However, the sp(2) bonding was found to continuously reduce with the increasing C2H2 gas pressure, this may be due to reduction of Cu nanocrystal at the higher pressure. FTIR results inferred various bonding states of carbon with carbon, hydrogen and oxygen. In addition, hydrogen content and sp(3) and sp(2) fractions in different Cu-DLC films were also estimated by FTIR spectra and were correlated with stress, electrical, optical and nano-mechanical properties of Cu-DLC films. The effect of indentation load (4-10 mN) on nano-mechanical properties of these films was also explored.

Item Type: Article
Additional Information: Copyright for this article belongs to M/s Elsevier.
Subjects: Chemistry
Applied Physics/Condensed Matter
Depositing User: Users 27 not found.
Date Deposited: 13 Mar 2020 11:10
Last Modified: 13 Mar 2020 11:10
URI: http://npl.csircentral.net/id/eprint/3521

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