Ghosh, Subir Kumar and Chowdhury, Prashanta and Dogra, Anjana (2013) Magnetic and magnetoresistance studies of the evolution of the magnetic layer structure with Co layer thickness in electrodeposited Co-Cu/Cu multilayers. Journal of Magnetism and Magnetic Materials, 327. pp. 121-124. ISSN 0304-8853

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The structural transformation of electrochemically deposited Co-Cu/Cu multilayers with magnetic layer thickness was monitored via measurements of magnetization and magnetoresistance. For this, electrodeposition of [Co (t(Co) nm)/Cu (4 nm)](50) multilayers were carried out by varying the Co-layer thickness (t(Co)) down to 0.2 nm from a sulfate based single solution electrolyte. Magnetization measurements showed the appearance of anisotropy, increase in remanence magnetization and coercivity with systematic increase of t(Co) from 0.2 to 1 nm. Magnetic field direction dependent magnetoresistance (MR) measurements revealed that the isotropy in MR changes with t(Co) from tridimensional at 0.2 nm to in-plane at 0.4 nm to fully anisotropic at 1.0 nm. This illustrated that a fully granular magnetic Co-layer structure (t(Co) = 0.2 nm) transforms into discontinuous layered one (t(Co) = 0.4 nm) due to coalescence of suparparamagnetic regions to a continuous ferromagnetic layer (t(Co) = 1 nm).

Item Type: Article
Additional Information: Copyright for this article belongs to M/s Elsevier.
Subjects: Materials Science
Applied Physics/Condensed Matter
Depositing User: Users 27 not found.
Date Deposited: 09 Jul 2020 11:10
Last Modified: 09 Jul 2020 11:10

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