Kaur, Shobhneek and Kumar, Ashok and Sharma, Amit L. and Singh, Dwijendra P. (2017) Influence of annealing on dielectric and polarization behavior of PVDF thick films. Journal of Materials Science: Materials in Electronics, 28. pp. 8391-8396. ISSN 0957-4522

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Abstract

The polyvinylidene fluoride (PVDF) thick film has been fabricated by a solution casting method. The fabricated film is subjected to annealing at 50, 90, 100, 110 and 130 A degrees C for 5 h. The effect of annealing on structural, crystalline, dielectric and polarization behavior is investigated. The beta-phase PVDF is found to coexist with alpha-phase for annealing temperature upto 100 A degrees C, after that beta-phase is converted to alpha-phase. The film annealed at 100 A degrees C, exhibits enhanced permittivity, reduced tangent loss and enhanced polarization. The dielectric permittivity and tangent loss of film annealed at 100 A degrees C are similar to 11 and similar to 0.025 respectively for the frequency range of 10(3)-10(5) Hz. The saturation polarization for this film is similar to 1.27 A mu C/cm(2). The enhanced dielectric permittivity and polarization for the film annealed at 100 A degrees C might be attributed to increase in crystalline alpha and beta-phase interface as well as crystalline amorphous interface. The thick film of PVDF with improved dielectric and polarization behavior could be useful for high power electronics application.

Item Type:	Article
Additional Information:	Copyright for this article belongs to M/s Springer Verlag.
Subjects:	Engineering > Electronics and Electrical Engineering Meteorology & Atmospheric Sciences Applied Physics/Condensed Matter
Divisions:	UNSPECIFIED
Depositing User:	Users 27 not found.
Date Deposited:	29 Oct 2018 11:03
Last Modified:	29 Oct 2018 11:03
URI:	http://npl.csircentral.net/id/eprint/2745

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