Bisht, Atul and Chockalingam, Sreekumar and Panwar, O. S. and Srivastava, A. K. and Kesarwani, Ajay Kumar (2015) Synthesis of Nanostructure Carbon Films Deposited by Microwave Plasma-Enhanced Chemical Vapor Deposition Technique at Room Temperature. Fullerenes, Nanotubes and Carbon Nanostructures, 23 (5). 455 -462. ISSN 1536-383X

Preview

PDF - Published Version Download (976Kb) | Preview

Abstract

This paper reports the synthesis of nanostructure carbon (ns-carbon) films deposited by microwave plasma-enhanced chemical vapor deposition (MW PECVD) technique at low pressure and room temperature. ns-carbon films have been characterized by scanning electron microscopy, electron dispersive x-ray spectroscopic analysis, atomic force microscopy, Raman spectroscopy, X-ray diffraction, UV-visible spectroscopy and high-resolution transmission electron microscopy. The shape of nanostructure is changing from granular to sheet-like structure when the pressure increased from 55 to 110 mTorr.

Item Type:	Article
Uncontrolled Keywords:	ns-carbon film, MWPECVD, SEM, XRD, HRTEM
Subjects:	Materials Science Physics > Atomic and Molecular Physics Nanoscience/ Nanotechnology
Divisions:	UNSPECIFIED
Depositing User:	Dr. Rajpal Walke
Date Deposited:	02 Dec 2016 07:48
Last Modified:	02 Dec 2016 07:48
URI:	http://npl.csircentral.net/id/eprint/2034

Actions (login required)

View Item