Swamy, G. Venkat and Rout, P. K. and Singh, Manju and Rakshit, R. K. (2015) Resistance minimum and electrical conduction mechanism in polycrystalline CoFeB thin films. Journal of Physics D: Applied Physics, 48 (17). 475002-1-475002-7. ISSN 0022-3727

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The temperature dependent resistance R(T) of polycrystalline ferromagnetic CoFeB thin films of varying thicknesses are analyzed considering various electrical scattering processes. We observe a resistance minimum in R(T) curves below similar or equal to 29 K, which can be explained as an effect of the intergranular Coulomb interaction in a granular system. The structural and Coulomb interaction related scattering processes contribute more as the film thickness decreases implying the role of disorder and granularity. Although the magnetic contribution to the resistance is the weakest compared to these two, it is the only thickness independent process. On the contrary, the negative coefficient of resistance can be explained by the electron interaction effect in disordered amorphous films.

Item Type: Article
Uncontrolled Keywords: ferromagnetic alloy, thin film, spintronics material
Subjects: Applied Physics/Condensed Matter
Depositing User: Dr. Rajpal Walke
Date Deposited: 06 Oct 2016 07:06
Last Modified: 06 Oct 2016 07:06
URI: http://npl.csircentral.net/id/eprint/1971

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