Kumar, Nitu and Misra, P. and Kotnala, R. K and Gaur, Anurag and Rawat, R. and Choudhary, R. J. and Katiyar, R. S. (2014) Polycrystalline Sr2FeMoO6 thin films on Si substrate by pulsed laser deposition for magnetoresistive applications. Materials Letters, 118. 200 -203. ISSN 0167-577X

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Polycrystalline Sr2FeMoO6 (SFMO) thin films were deposited at different substrate temperatures (500-800 degrees C) on STO buffered Si (100) substrates by pulsed laser deposition (PLD). Structural analysis shows the single phase formation of polycrystalline SFMO thin films. A large (similar to 12%) high field magnetoresistance (HFMR) was observed at 5 K in polycrystalline films deposited at 800 degrees C. First time, we studied the MR effect in polycrystalline SFMO thin films grown on Si substrate, which make them very promising for magnetoresistive and spintronic applications and possibly open the future prospect for their possible integration in microelectronic industries.

Item Type: Article
Additional Information: Copyright for this article belongs to M/S Elsevier.
Uncontrolled Keywords: Thin films Physicalvapordeposition X-raytechniques
Subjects: Materials Science
Depositing User: Dr. Rajpal Walke
Date Deposited: 03 Nov 2015 06:02
Last Modified: 03 Nov 2015 06:02
URI: http://npl.csircentral.net/id/eprint/1470

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