Tripathi, R. K. and Panwar, O. S. and -, Ishpal and Chockalingam, Sreekumar (2014) Growth and characterization of nitrogen incorporated amorphous carbon films haying embedded nanocrystallies. PHYSICS OF SEMICONDUCTOR DEVICES Book Series: Environmental Science and Engineering: Environmental Engineering. 685-688 .

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This paper reports the growth and characterization of nitrogen incorporated amorphous carbon films having embedded nanocrystallites deposited by filtered anodic jet carbon arc technique. The films are characterized by X-ray diffraction, scanning electron microscopy, atomic force microscopy, Raman, residual stress and nanoindentation. The properties are found to depend on the substrate bias. The film deposited at -60 V substrate bias shows maximum hardness of 24 GPa and elastic modulus of 215 GPa.

Item Type: Article
Additional Information: Copyright for this article belongs to M/S Springer International Publishing Switzerland.
Subjects: Engineering
Materials Science
Depositing User: Dr. Rajpal Walke
Date Deposited: 05 Oct 2015 11:34
Last Modified: 05 Oct 2015 11:34

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