Tripathi, R. K. and Panwar, O. S. and -, Ishpal and Chockalingam, Sreekumar (2014) Growth and characterization of nitrogen incorporated amorphous carbon films haying embedded nanocrystallies. PHYSICS OF SEMICONDUCTOR DEVICES Book Series: Environmental Science and Engineering: Environmental Engineering. 685-688 .

PDF - Published Version Restricted to Registered users only Download (688Kb) | Request a copy

Abstract

This paper reports the growth and characterization of nitrogen incorporated amorphous carbon films having embedded nanocrystallites deposited by filtered anodic jet carbon arc technique. The films are characterized by X-ray diffraction, scanning electron microscopy, atomic force microscopy, Raman, residual stress and nanoindentation. The properties are found to depend on the substrate bias. The film deposited at -60 V substrate bias shows maximum hardness of 24 GPa and elastic modulus of 215 GPa.

Item Type:	Article
Additional Information:	Copyright for this article belongs to M/S Springer International Publishing Switzerland.
Subjects:	Engineering Materials Science Physics
Divisions:	UNSPECIFIED
Depositing User:	Dr. Rajpal Walke
Date Deposited:	05 Oct 2015 11:34
Last Modified:	05 Oct 2015 11:34
URI:	http://npl.csircentral.net/id/eprint/1316

Actions (login required)

View Item