Srivastava, Sanjay K and Vankar, V. D. and Kumar, Vikram and Singh, V. N. (2008) Effect of Substrate Morphology on Growth and Field Emission Properties of Carbon Nanotube Films. Nanoscale Research Letters , 3 (6). 205 -212 . ISSN 1931-7573

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Abstract

Carbon nanotube (CNT) films were grown by microwave plasma-enhanced chemical vapor deposition process on four types of Si substrates: (i) mirror polished, (ii) catalyst patterned, (iii) mechanically polished having pits of varying size and shape, and (iv) electrochemically etched. Iron thin film was used as catalytic material and acetylene and ammonia as the precursors. Morphological and structural characteristics of the films were investigated by scanning and transmission electron microscopes, respectively. CNT films of different morphology such as vertically aligned, randomly oriented flowers, or honey-comb like, depending on the morphology of the Si substrates, were obtained. CNTs had sharp tip and bamboo-like internal structure irrespective of growth morphology of the films. Comparative field emission measurements showed that patterned CNT films and that with randomly oriented morphology had superior emission characteristics with threshold field as low as ~2.0 V/μm. The defective (bamboo-structure) structures of CNTs have been suggested for the enhanced emission performance of randomly oriented nanotube samples.

Item Type:	Article
Subjects:	Materials Science Physics
Divisions:	UNSPECIFIED
Depositing User:	Ms Neetu Chandra
Date Deposited:	06 Jan 2014 13:04
Last Modified:	06 Jan 2014 13:04
URI:	http://npl.csircentral.net/id/eprint/1001

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